Figure 1 (a) Structure of the mesoscopic objective, (b) Aberration distribution of the mesoscopic objective, (c) Wide-field imaging system built with the mesoscopic objective, (d) Laser point-scanning ...

Avantier's case study examines the high NA infinity conjugate long working distance microscope objective, designed for optical tweezers and other precision applications. With a 16 mm focal length, 14 ...

The xView module enhances real-time imaging in multiphoton microscopy with improved precision, speed, and data quality.

The future of semiconductor technology is often viewed through the lenses of photolithography equipment, which continues to offer better resolution for future process nodes despite an almost perpetual ...

The top three foundries plan to implement high-NA EUV lithography as early as 2025 for the 18 angstrom generation, but the replacement of single exposure high-NA (0.55) over double patterning with ...